GFET-S11 (Die size 10 mm x 10 mm) - Processed in ISO 7 Cleanroom
The GFET-S11 chip from Graphenea provides 31 graphene devices with a van der Pauw (vdP) geometry, distributed in 3 different sizes. 3 vdPs have a 2x2mm2 footprint, 14 vdPs have a 500x500µm2 footprint and 14 vdPs have a 125x125µm2 footprint. These devices have an optimized geometry for 4-probe measurements in a vdP configuration. These varying graphene device dimensions allow investigation of geometry dependence on device properties, enabling immediate optimization.
Typical Specifications
- · Growth method: CVD synthesis
- · Graphene transfer: Polymer assisted transfer
- · Substrate: Si/SiO2
- · Substrate thickness: 675 μm
- · Resistivity of Si substrate: 1-10 Ω.cm
- · Gate oxide thickness: 90 nm
- · Metallization: 50nm Au-based Contacts
- · Chip dimensions: 10 mm x 10 mm
- · Number of GFETs per chip: 31
- · Optical Yield: ≥75
- · Average field-effect mobility: >1000 cm2/V·s
- · Average Dirac point: <25 V
Absolute maximum ratings
- · Maximum gate-source voltage (back gating): ± 50V
- · Maximum temperature rating: 150 °C
- · Maximum drain-source current density: 107A.cm-2
Quality control
All our samples are subjected to a rigorous QC in order to ensure a high quality products.
- · Optical microscopy inspection of all the devices
- · Raman Spectroscopy of each fabrication batch
- · Electrical characterization via back gating of each fabrication batch
Applications
Graphene field-effect transistors (GFETs) have unprecedented sensitivity to the surrounding environment and is an ideal transducer for a variety of sensing applications. Depending on the application, GFETs can be tuned to be sensitive only to the stimulus of interest and have shown breakthrough performance in areas such as graphene device research, quantum transport, gas sensors, chemical sensors and magnetic sensors.
Publications
"Hybridization of graphene‐gold plasmons for active control of mid‐infrared radiation"
DOI:10.1109/EuMIC.2016.7777516
"Graphene field effect transistors on flexible substrate: Stable process and high RF performance"
DOI:10.1038/s41598-024-57216-6
"High-Gain Graphene Transistors with a Thin AlOx Top-Gate Oxide"
Scientific Reports volume 7, Article number 2419 (2017) doi:10.1038/s41598-017-02541-2