GRAPHENEA FOUNDRY

MultiProjectWafer Runs

Graphenea now offers MultiProjectWafer (MPW) runs. Through its mask-sharing scheme, custom devices in small batches are now available at affordable costs. Sharing the cost of fabrication allows to lower the entry barrier for researchers and companies interested in developing graphene-based technologies. We offer a reduced turnaround time compared to conventional MPW runs of just 3 months

Reduced waiting time with runs in February, May, August and November.

Ideal for batch prototyping and proof-of-concept validation


Min. cm2 per run: 6

PF1 from $1200

PF2 (poly) from $1800

MULTIPROJECTWAFER PROCESS
  1. Your design…
    Graphenea
  2. …is assembled together within other designs that share the same process flow…
    Graphenea
  3. …and then are manufactured across the wafer
    Graphenea

MULTIPROJECTWAFER CALENDAR

Open to requests

No requests / MPW Closed

JAN FEB MAR APR MAY JUN JUL AUG SEP OCT NOV DEC

PROCESS FLOW 1

General Sensing

PROCESS FLOW 2

Bio Sensors

PROCESS FLOW 3

HKMG

PROCESS FLOW 1

General Purpose:

· Au (50 nm) contacts
· Optional: Ti, Ni, Al.
· Graphene patterning

Download the Guidelines and Design Rules

PROCESS FLOW 2

Liquids & Bio:

· Au (50 nm) contacts
· Graphene patterning
· Optional: Ti, Ni, Al. · Optional: Al2O3 encapsulation (50 nm)
· Optional: polymeric encapsulation (200 nm)
· Optional: Via opening

Download the Guidelines and Design Rules

PROCESS FLOW 3

HKMG:

· High-K Metal Gate
· Gold (50 nm) contacts
· Graphene patterning
· Optional: Back gate (down to EOT = 5 nm)
· Optional: Top gate (down to EOT = 20 nm)

Download the Guidelines and Design Rules